Ultra-fine cleaning system for high purity components

A manufacturer of complex mechanical assemblies relies on ultra-fine cleaning with cleanroom integration. The system delivers high-purity conditions of the highest standard and is based on many years of practical experience.

Swacrit Systems GmbH specializes in the production of complex mechatronic composite assemblies and high-precision components and is an innovation partner for high-tech customers from the semiconductor/analytics industry and medical technology, among others. The rapidly growing Austrian company needed an ultra-fine cleaning solution with a connection to two cleanrooms for its 3rd production site in Nassereith/Tyrol. This was designed and recently delivered by LPW Reinigungssysteme GmbH. The system offers high purity at the highest level and represents one of the development highlights of the Riederich cleaning experts.

LPW delivered one of the first standard systems with an integrated CNp process (cyclic nucleation) to the Wildermieming plant back in 2015. Based on the positive experience with this system for cleaning stainless steel components from high-vacuum technology and further discussions in the course of planning for the new plant at the end of 2023, the Tyroleans placed another order with the Swabians.

The ultra-fine cleaning system was developed within 12 months on the basis of the PowerJet Ultra series, which on the one hand consists of modules that have been tried and tested over many years and on the other hand meets the state of the art in terms of high purity. The dimensions of the system were simply adapted to the requirements of Swacrit Systems. The PowerJet 800 T6 Triple Ultra was delivered with 3 x Ultra treatment chambers: Chamber 1 (cleaning 1, rinsing 1), Chamber 2 (cleaning 2, rinsing 2 and 3, drying 1) and Chamber 3 (ultra-fine rinsing, drying).

All chambers are equipped with the new generation of the CNp process. This is characterized, among other things, by automatic temperature compensation. The process closely follows the vapor pressure curve. Pressure surges and thus material damage are ruled out. The CNp effect of the asymmetrical volume flow has been further refined as it shows the best results in ultra-fine cleaning. Ultrasound is also integrated in chambers 1 and 2. The media treatment of the cleaning and rinsing circuits takes place with a high filtration rate in the supply and return flow as well as in the bypass with filter finenesses down to the sub-μm range. The IR/hot air vacuum systems are designed in such a way that, in addition to efficient drying in accordance with the purity requirements, they do not contribute to cross-contamination that impairs quality. Final drying can also be carried out in a nitrogen atmosphere. The rinsing bath is treated via an integrated demineralized water circulation system, the final rinsing circuit via the LPW Ultra ultrapure water module. This module with a media supply of approx. 1,300 liters for pre-tempered water (up to max. 65°C) is also the ultrapure water supply for the entire system. The automation, designed and made by LPW, is made of full stainless steel and is equipped with FFU transfer lines, clean room airlocks and the transfer in the clean room

LPW CEO Gerhard Koblenzer: "This ultra-fine cleaning system is currently one of our development highlights. This is partly due to the process control software, the special monitoring approach in conjunction with a complex batch protocol and the high-quality media preparation, especially in the rinsing baths. The dimensions and design of the ultrapure water supply unit are also new. It is significantly more powerful and can also guarantee an ultrapure water loop in the final rinse in addition to pure make-up. Furthermore, this concept integrates process monitoring with extensive sensor equipment for particle, TOC, conductivity and pH value measurement in the relevant sub-processes in such a way that the respective cleaning and rinsing processes can be monitored and centrally evaluated in the various phases."

Jürgen Wildauer, Production Manager at Swacrit Systems GmbH, explains the details of the decision: "With our new production site in Nassereith, we are able to meet the highest customer requirements in terms of cleanliness. The cleaning system for high-purity components plays a central role in our production concept. The cleaning process is directly connected to our ISO 6 cleanroom, which leaves open the option of upgrading to ISO 5 in the future. According to our specifications, cleaning must be carried out one class above the cleanroom classification. Particle purity and the removal of filmic contamination are extremely important to us. It is also our aim to ensure maximum automation of our production facilities. After a comprehensive market screening, it became clear to us that only very few cleaning system manufacturers can fully meet our requirements. The decisive reasons why we chose LPW were the impressive reference list of customers in the semiconductor, analytical and medical technology sectors, as well as the possibility of combining a wide range of cleaning technologies in one system. Particularly noteworthy is the patented CNp function, which makes the decisive difference for us. The professional approach from the development to the implementation of the project has confirmed our decision in favor of an LPW system. Finally, it should also be mentioned that LPW has its own in-house process development department in addition to plant construction in order to achieve the highest requirements together with the customer. With the new plant, we are able to meet the constantly increasing customer requirements in the high purity sector." (OM-4/26)