Pfeiffer Vacuum presents new ACP 90 multistage Roots pumps

Created by OM Equipment/AccessoriesPfeiffer Vacuum
Roots pump ACP 90 Pfeiffer Vacuum
New multi-stage Roots pump ACP 90 from Pfeiffer Vacuum (Image: Pfeiffer Vacuum)

Pfeiffer Vacuum, one of the world's leading suppliers of vacuum technology, presents the new ACP 90 multistage Roots pumps, which are designed for oil- and particle-free applications in the pressure range between atmospheric pressure and 3x10-2 hPa.

The new vacuum pumps from Pfeiffer Vacuum meet the requirements of applications that require a clean and dry vacuum, such as drying, sterilization, coating, semiconductor and R&D applications. Due to their unique design, the pumps are robust and suitable for frequent pumping of large volumes. High-quality materials make them resistant to slightly corrosive gases.

The ACP 90 is suitable wherever large quantities of condensable gases are pumped, such as in drying applications, high humidity environments or pumping applications for large insulation volumes. Jean-Philippe Briton, Product Manager at Pfeiffer Vacuum, explains: "We are particularly proud of the built-in intelligence that enables high pumping speed at high pressure, which is important when pumping large volumes. With a very low power consumption of 2 kW at atmospheric pressure, the ACP 90 is also an energy-efficient solution." In addition, the pump also complies with CE and UL/CSA standards.

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