XPS

XPS, or X-ray photoelectron spectroscopy, is an advanced analytical technique that is widely used in surface technology. This method is used to obtain detailed information about the chemical composition of a material's surface.

In XPS analysis, the material is irradiated with X-rays, which causes electrons to be knocked out of the layers of the material close to the surface. The energy and intensity of these emitted electrons are measured and analyzed. From the resulting spectra, conclusions can be drawn about the chemical elements and their bonds on the surface of the material.

In surface technology, XPS is often used to characterize the surface composition of coated materials, to identify the type and quantity of impurities present on the surface and to investigate the interactions between coatings and substrates. XPS analysis offers high sensitivity and resolution, making it possible to detect and analyze even small amounts of contaminants or thin layers on the surface. This makes XPS a valuable tool for quality control and defect analysis in surface technology.

In addition, XPS can also be used to investigate surface chemistry and reaction mechanisms in various surface treatment processes, such as etching and passivation processes, coatings, cleaning and functionalization. Overall, XPS is a powerful analytical technique in surface engineering that makes it possible to obtain detailed information about the chemical composition and structure of surfaces. By applying this technique, new insights can be gained that contribute to optimizing surface treatment processes and improving the quality of coated materials.