X-ray photoelectron spectroscopy (XPS)

X-ray photoelectron spectroscopy (XPS) is an advanced analytical technique used in materials science and surface analysis. It enables the chemical composition of surface materials to be examined at an atomic level.

The principle of XPS is based on the photoelectric effect, which states that photons (in this case X-rays) can release electrons from the uppermost layers of a material. The energy of the released electrons is measured and the chemical composition of the material can be derived from this data.

During an XPS analysis, the material to be examined is irradiated with monochromatic X-rays. The emitted electrons are registered in a detector and their energy is measured. By evaluating the energy distribution of the photoelectrons, researchers can obtain information about the chemical elements, their oxidation states and the bonding conditions in the uppermost atomic layer of the material.

XPS is used in various scientific and industrial fields. In materials research, this technique helps to characterize the surface composition of samples. In the semiconductor industry, for example, XPS is used to analyze the thinnest layers on semiconductor components. XPS is also of crucial importance in catalysis research, the development of coatings and in the quality assurance of materials.

X-ray photoelectron spectroscopy provides detailed insights into the chemical nature of material surfaces and plays a key role in optimizing materials for specific applications.