Resists

Resists play a crucial role in surface technology, particularly in the field of micro and nanofabrication. A resist is a thinly applied layer that is placed on a surface and serves to protect certain areas from further processing steps. This protective mechanism makes it possible to create precise patterns and structures on the surface, which are used in various industries, particularly in semiconductor and microelectronics manufacturing.

The resists are normally applied to the surface to be processed and then structured using various exposure and etching techniques. In photolithography, for example, the resist is exposed to UV light, which causes chemical or physical changes in the exposed areas. The resist is then developed to remove the unexposed or exposed areas, depending on whether a positive or negative resist is used.

In surface technology, resists serve as a protective layer for various processing steps such as etching, coating or doping. They enable the creation of high-precision patterns and structures on the micro- and nanoscale, which are crucial for the production of microchips, sensors and other highly integrated components.

The selection of the appropriate resist depends on the specific requirements of each application, including the desired pattern resolution, chemical resistance and processing capabilities. The correct application of resists is a key aspect in surface engineering that helps to produce precise and high-quality micro and nano devices.