Plasma-PVD

Plasma Physical Vapor Deposition (PVD) is an advanced coating process that is widely used in surface technology. In this process, a plasma is used to vaporize materials in a vacuum chamber and deposit them onto a substrate.

The use of plasma allows for improved control of coating properties and offers a wide range of application possibilities. Plasma PVD can use a variety of materials for coating, including metals, ceramics, polymers and composites. These materials can be fed in the form of targets or in gaseous form, allowing the creation of coatings with different properties and functionalities. Plasma PVD offers precise control over the properties of the coatings produced, including thickness, composition, structure and surface morphology. By optimizing the process parameters, coatings with specific properties can be produced, such as high hardness, wear resistance, corrosion resistance, optical transparency or electrical conductivity.

Plasma PVD is used in a variety of applications, including the production of hard coatings for tools and wear parts, decorative coatings for jewelry and watches, transparent barrier coatings for packaging materials, electronic and optical coatings for semiconductor and display technologies, and functional coatings for medical devices and implants. Plasma PVD offers several advantages over conventional coating processes, including improved adhesion, higher layer density, more precise layer control, lower substrate temperatures and a wider range of materials. These advantages make plasma PVD an attractive option for producing high-quality, customized coatings for a variety of applications.