Plasma cleaning

Plasma cleaning is a process used in various industrial sectors to remove contaminants from surfaces. This process is based on the use of plasma, an ionized gas state, to remove material from the surface of a substrate.

During the plasma cleaning process, a gas, typically a noble gas such as argon, is put into a plasma state. By applying high-frequency voltage or microwave energy, charged particles, ions and electrons are created in the plasma. These high-energy species interact with the surface of the material to be cleaned. Plasma cleaning leads to physical and chemical processes that break the adsorption of impurities on the surface. Ions and radicals in the plasma can oxidize or simply remove organic residues. The result is a thorough cleaning of the surface of unwanted substances without leaving any residue behind.

This cleaning process is used in various industries, including semiconductor production, electronics manufacturing and the surface treatment of materials such as plastics or metals. The advantage of plasma cleaning is that it is gentle on sensitive materials and enables effective removal of contaminants without the use of solvents.