Ion plating

Ion plating, also known as ion implantation, is a process for the targeted modification of the surface of solid-state materials in semiconductor technology. In this process, ions are shot at the surface of the material with high energy, causing them to penetrate the top layer. The depth of this penetration can be precisely controlled by controlling the ion energy.

This process is used to change the electrical properties and structural characteristics of the surface. The targeted introduction of impurities can create doping regions that influence the conductivity of the material. This is particularly important in the manufacture of microelectronic components such as transistors and diodes.

Ion plating makes it possible to tailor the surface, which is of crucial importance in semiconductor technology. It helps to produce components with specific electronic properties and therefore plays a key role in the ongoing development of microelectronics.