Ion cluster beam deposition (ICDB)

Ion cluster beam deposition (ICDB) is a surface technology process used for the targeted production of thin layers on material surfaces. In this process, ion clusters consisting of a large number of atoms are directed onto the surface of the substrate to form the desired coating.

The process of ICDB typically begins with the creation of ion clusters consisting of a multitude of atoms of the coating material. This can be done by various methods, including gas aggregation, laser ablation or condensation from the vapor phase. The generated ion clusters are then accelerated and directed to the surface of the substrate.

When the ion clusters hit the surface, a variety of interactions occur between the clusters and the atoms on the surface of the substrate. These interactions can lead to adsorption, desorption, diffusion and reaction of atoms, which ultimately results in the formation of a thin film.

An important advantage of ICDB is its ability to produce layers with a precise thickness and composition. By controlling the process parameters such as ion energy, cluster size and radiation angle, the properties of the produced coating can be specifically controlled. This makes it possible to produce customized coatings with specific mechanical, optical or electronic properties.

ICDB is used in various fields, including the semiconductor industry, optics, materials science and nanotechnology. The process is used to produce coatings on various substrates such as metals, semiconductors, polymers and glass. By precisely controlling the coating processes, customized materials can be developed to meet the requirements of different applications.