Ion Beam Mixing (IBM)

Ion Beam Mixing (IBM) is a process in surface technology that is used to produce thin layers on material surfaces. In this process, an ion beam is directed at the surface of the substrate, modifying the surface and achieving a mixture of materials at the atomic level.

The IBM process typically begins with preparation of the substrate, which is cleaned and possibly pre-treated to improve the adhesion of the thin film. An ion beam is then directed at the surface, bombarding the surface and partially removing the surface material.

During the IBM process, the ions interact with the atoms on the surface of the substrate. This leads to the diffusion of atoms into the surface, creating a mixture of materials. By controlling the ion energy, the radiation angle and other process parameters, the thickness and composition of the mixed layer can be specifically controlled.

IBM is often used to achieve various functions on surfaces, such as improving the adhesion of coatings, forming alloys or producing protective layers. The process makes it possible to combine materials with different properties to achieve the desired mechanical, chemical or electrical properties.

IBM is used in various areas, including the semiconductor industry, surface coating for electronic components, the production of wear-resistant coatings and the development of materials for energy generation. By precisely controlling the process parameters, customized coatings can be produced to meet the specific requirements of different applications.