Ion Beam Assisted Deposition (IBAD)

Ion Beam Assisted Deposition (IBAD) is a surface coating process that is widely used in various industries, including semiconductors, optics, materials science and aerospace. In this technique, a thin coating material is applied to a substrate surface using an ion-accelerated beam.

The IBAD process typically involves several steps. First, the substrate is prepared by cleaning it and possibly applying an adhesion layer to improve the adhesion of the coating. Next, the coating material is generated in the form of vapor or ions. This coating material is then accelerated using an ion beam and directed onto the substrate.

The ion-accelerated beam plays a crucial role in the IBAD process. By controlling the energy and direction of the ions, the properties of the applied coating can be specifically influenced. This makes it possible to produce thin films with precise thicknesses, compositions and microstructures.

An important advantage of the IBAD process is its ability to produce coatings with outstanding mechanical, optical and electronic properties. By using ions during the coating process, for example, the adhesion, density and hardness of the coating can be improved. In addition, the precise control of ion energy and direction enables the production of coatings with low stresses, low roughness and excellent homogeneity.

IBAD has applications in a wide range of fields, including the manufacture of semiconductor devices, the coating of optical components, the development of protective coatings for electronic devices and the production of functional coatings for medical implants. Due to its versatility and its ability to produce customized coatings with high precision, IBAD has become an important tool in surface technology.