Inductively Coupled Plasma (ICP)

Inductively Coupled Plasma (ICP) is a powerful technique in analytics and surface technology that is based on the generation and excitation of a plasma jet. This plasma is generated by the interaction of a high-frequency electric field and a gas, typically argon. ICP is used in various fields, including mass spectrometry, surface coating and chemical analysis.

In mass spectrometry, ICP is used as an ionization source to analyze a variety of sample types. The high temperature of the plasma jet causes the sample atoms or molecules to become ionized, allowing them to be introduced into a mass spectrometer and analyzed. This technique allows the elemental composition of samples to be determined with high sensitivity and precision.

In surface technology, ICP is often used in conjunction with plasma-based coating technology. By integrating ICP into coating systems, thinner and more homogeneous coatings can be produced, as the plasma improves the interaction between coating materials and substrate. This results in coatings with improved mechanical, optical and electronic properties.

Overall, ICP is an extremely versatile technique that is used in various fields of science and technology. Its ability to generate a powerful plasma jet and excite atoms makes it an indispensable tool for analytics, surface engineering and materials science.

Back to list

This definition is taken from the surface technology encyclopedia from Surface Technology Online. You can find many more technical terms from the surface technology industry in our lexicon overview.

Advertisement

Would you like to add technical terms to the surface technology encyclopedia (also with a mention as author)? Please contact us by mail or phone to discuss further details.