HiPIMS

HiPIMS (High-Power Impulse Magnetron Sputtering) is a PVD coating process in which the sputtering target is energized by short, very high-power current pulses. Compared to conventional magnetron sputtering, this results in a significantly higher degree of ionization of the evaporated target material. This allows for the production of particularly dense, smooth, and firmly adherent thin films.

In the HiPIMS process, the power pulses typically last only a few microseconds and are interrupted by longer pauses. During the pulses, high power densities are generated without thermally overloading the target. A large proportion of the released metal atoms are ionized and can be precisely accelerated onto the workpiece. This improves coating formation and allows for precise control of the coating properties.

HiPIMS coatings are characterized by high density, low porosity, excellent adhesion, and a uniform microstructure. As a result, they enhance the wear, corrosion, and oxidation resistance of components, among other benefits. At the same time, defects such as droplet formation or columnar structures—which can occur in other PVD processes—can be significantly reduced. The process is used, among other things, to produce hard coatings such as titanium aluminum nitride (TiAlN), chromium nitride (CrN), or aluminum chromium nitride (AlCrN). Typical applications include cutting tools, forming tools, precision components, medical technology components, and components for the aerospace and automotive industries.

Compared to conventional magnetron sputtering processes, HiPIMS offers higher coating quality and greater process flexibility. However, this comes at the cost of a lower deposition rate and higher demands on the power supply and process control. Thanks to continuous advancements, the process is becoming increasingly important for sophisticated functional coatings in industrial surface engineering.