Epitaxy

Epitaxy is an advanced process in surface technology that is widely used in the microelectronics and semiconductor industries. This technique enables the controlled crystal growth of thin films on a substrate. The precision and control offered by epitaxy play a crucial role in the manufacture of highly integrated circuits and other electronic components.

In epitaxy, the growth of the thin film is controlled so that it adopts the same crystal structure as the underlying substrate. This precise growth enables the creation of layers with outstanding crystal quality and minimal defects. There are different methods of epitaxy, including Chemical Vapor Deposition (CVD) and Molecular Beam Epitaxy (MBE).

In vapor phase epitaxy, the substrate to be coated is brought into contact with gaseous precursor compounds. These compounds decompose on the surface of the substrate, resulting in crystal growth of the thin film. Molecular beam epitaxy, on the other hand, uses a beam of molecules directed at the substrate surface. This enables precise control of layer thicknesses and compositions.

The applications of epitaxy in surface technology are diverse. They range from the production of semiconductor components such as transistors and diodes to advanced materials for photonics and optoelectronics. By precisely controlling the crystal structure, components can be produced that offer high performance and reliability.

Epitaxy in surface technology is crucial to advances in the electronics industry, particularly in the field of micro- and nanotechnology. Through controlled layer formation at the atomic level, epitaxy enables the development of highly advanced and powerful electronic components.