Cathodic sputtering

Cathodic sputtering, also known as sputtering, is a process in the field of surface technology that is used for the targeted coating of materials, particularly metals. In this process, materials are physically atomized by ion bombardment in a vacuum chamber.

The cathode sputtering process begins with the placement of the material to be coated, the cathode, in the vacuum chamber. At the same time, a material, typically a precious metal such as titanium or aluminum, is positioned nearby as the coating material. An electrical voltage is applied, which generates ions of the coating material.

These ions hit the surface of the cathode and dissolve atoms from the material. The dissolved atoms are deposited on the surface of the cathode, forming a thin, uniform coating. This process enables precise control of the coating thickness and composition.

Cathode sputtering is used in various industries, including electronics and semiconductor manufacturing, optics and the coating of components for corrosion protection. The coatings produced are characterized by their hardness, adhesion and homogeneity, which makes them attractive for a wide range of applications.