Autocatalytic deposition

Autocatalytic deposition - or chemical vapor deposition (CVD) - is a process for coating surfaces with metallic layers without the use of an electric current. In this process, metallic ions are deposited from a solution onto the surface of a substrate, using a reducing agent to reduce the metal ions and form the metal layer.

The process is based on chemical reactions that take place on the surface of the substrate. By controlling factors such as temperature, pH and concentration of the solution, the deposition rate and the thickness of the metal layer can be controlled. Electroless metal deposition offers several advantages, including the ability to produce uniform coatings on complex-shaped surfaces and minimize the formation of macro-defects.

Autocatalytic deposition is used in a variety of applications, including the production of decorative coatings, anti-corrosion coatings, electronic components and sensors. It enables the cost-effective production of high-quality metal coatings on a variety of substrate materials and contributes to the development of innovative products and technologies in various industries.