EFDS Workshop Characterization in Thin Film Technology

Precise characterization methods are the key to the development, evaluation and quality control of functional thin-film systems. Robust, automatable and inline-capable processes are becoming increasingly important, especially on an industrial scale. At the same time, there is a growing need for meaningful and quantitative data for research, simulation and process control - often down to the nanometer range. The EFDS workshop Characterization in Thin Film Technology is aimed at experts from research, industry and metrology development who deal with modern characterization methods for thin film systems - both in basic research and in application technology. The focus is on issues relating to the selection, integration and further development of suitable measurement methods for determining physical, chemical, mechanical and functional coating properties.

Broad range of presentations at the Characterization in Thin Film Technology workshop

The workshop will kick off with an overview presentation by Nazlim Bagcivan (Schaeffler Technologies AG & Co. KG), who will shed light on the role of characterization in large-scale production. Thomas Chudoba (ASMEC) will present current developments in instrumented indentation testing under the title "Nanoindentation 2.0". Dietmar Schorr (Steinbeis Center Tribology Surface Analysis and Material Testing) will shed light on the successful transfer of analytical methods from the laboratory to series production and provide practical insights into which characteristic values are decisive in real applications. The topic will be supplemented by Susanne Friedrich (Institut für Korrosionsschutz Dresden GmbH IKS), who will address special requirements for the characterization of thin-film systems for corrosion protection - an area that is often strongly application-driven. Dr. Michael Tkadletz (Montanuniversität Leoben) will show how atomic probe tomography methods can be used for high-resolution analysis of complex microstructures, especially for structured surfaces. Stefan Makowski (Fraunhofer IWS) will present laser acoustic surface wave spectroscopy (LAwave), a non-contact, non-destructive method that is becoming increasingly relevant for industrial real-time applications.

Two workshop days with a wide range of topics

The second day of the workshop will continue the wide range of topics and will start with a presentation by Paul Mayrhofer (TU Vienna) on micropillar testing. Thomas Schütte (PLASUS GmbH) will shed light on process monitoring in thin-film technology and discuss the path from classic measurement technology to AI-supported strategies. Wulf Grählert (DIVE) will present the use of hyperspectral analysis for the two-dimensional inspection of coating systems. Mike Hettich (RECENDT) will provide a practical insight into laser ultrasonic methods, showing how non-destructive testing methods can also be used in complex geometries and with high demands on measurement speed and accuracy. The final thematic block will focus on the integration of digitalization, simulation and artificial intelligence. Hartmut Enkisch (Carl Zeiss) will shed light on characterization approaches for sophisticated layer systems in EUV lithography. Peter Gumbsch (Fraunhofer IWM) will show how simulation-based development can be used to optimize application-specific coating systems in a targeted manner - incorporating models for predicting failure and service life. Finally, Dr. Patrick Kraus-Füreder (RISC Software GmbH) will discuss data-driven AI models. The program will be rounded off by additional technical contributions from Fraunhofer IKTS, ICS Innovative Coating Solutions and Chipmetrics GmbH, among others. Further information on the program and registration can be found online at EFDS.